Imaging conditions for electron-beam micromachining
article
In electron‐beam micromachining the highest attainable power density in the substrate material is required for material removal. The application of the Zr/W(100) thermal field emitter combines the advantages of a low electron energy for a minimum electron penetration range in the substrate and a high current density in the final spot. The range of final electron spot sizes considered is from 10 to 100 nm. The spot size on‐axis, as well as off‐axis when scanning the beam, is mainly limited by chromatic aberration. A considerable improvement of the power density, up to about 108 W/cm2 at 3 kV, is obtained by using a high beam current collection efficiency and a symmetrical imaging system of unit magnification. Therefore, a power density of more than 1013 W/cm3 for most of the substrate materials results, allowing operation times of less than 1 μs per image element. A proposed illumination system for electron‐beam micromaching with a working distance of 4 mm is outlined. The intention is to replace the electron optics of a SEM by the proposed illumination system for micromaching purposes.
TNO Identifier
267432
Source
Journal of Vacuum Science and Technology, 15(3), pp. 1053-1055.
Pages
1053-1055
Files
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