High Throughput Atomic Force Microscope for Self-Assembled Monolayers Metrology and defect inspection
conference paper
Self-Assembled Monolayers (SAM) are a promising new development for patterning and templating for Atomic Layer Deposition (ALD). For this application quality of the SAM is critical, both with regard to surface coverage and adherence to the substrate. Even the smallest pinholes (<1 nm), whether present originally or formed during ALD, can be disastrous as ALD will grow material on each exposed surface site. Evaluating the quality of the SAM therefore poses stringent requirements for the resolution and accuracy of inspection tools. We report here on the use of automated high throughput Atomic Force Microscopy (AFM) as a tool to inspect SAMs. Having a high-throughput automated AFM system and analysis is critical to reach statistically relevant results and perform inspection over a significant distribution of sites on the substrate.
TNO Identifier
1019189
Source title
13th International Workshop on Nanomechanical Sensing, NMC 2016, Delft, The Netherlands
Collation
2 p.
Files
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