3D volumetric energy deposition of focused helium ion beam lithography: visualization, modeling, and applications in nanofabrication
article
In this paper, 3D volumetric energy deposition and local crosslinking of hydrogen silsesquioxane (HSQ) are experimentally and numerically explored in focused helium ion beam lithography (HIBL). In particular, a through-membrane exposure method is developed to make visible and subsequently to measure the 3D interaction volume and energy deposition of helium ions in HSQ. By comparing the actual dimensions of the crosslinked HSQ structures with Monte Carlo modeling of the spatial distribution of the energy deposition, the critical energy density for crosslinking HSQ is obtained. Finally, 3D nanofabrication of complex crosslinked HSQ nanostructures such as embedded nanochannels and suspended grids is demonstrated using two different exposure configurations. The proposed method expands the 2D point spread function of HIBL into three dimensions, thus opening a new avenue for nanoscale 3D fabrication.
Topics
3D nanofabricationFocused helium ion beam lithographyHydrogen silsesquioxaneLocalized volumetric energy depositionElectron beam lithographyNanotechnologyOptical transfer function3D interactionsCritical energy densityEnergy depositionsHelium ion beamsMonte Carlo modelVolumetric energyThree dimensional computer graphics
TNO Identifier
820472
ISSN
21967350
Source
Advanced Materials Interfaces, 5(12)
Publisher
Wiley
Article nr.
1800203
Collation
8 p.
Place of publication
Weinheim, Germany
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