Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES

other
2024
Rooij-Lohmann, V.I.T.A.

Mukherjee, S.

Wu, C.C.

Ebeling, R.P.

Pandey, K.

Es, M.H. van

Jonckheere, R.
Topics
Nanotechnology
TNO Identifier
1001012
Repository link
https://resolver.tno.nl/uuid:b91026d6-5b81-4b1f-a988-0ed5694770e3
Source title
SPIE Photomask Technology + EUV Lithography conferentie
Pages
1-16
Files
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