Preface: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2: New Materials, Processes, and Equipment

Roozeboom, F.; Timans, P.J.; Öztürk, M.C.; Iwai, H.; Kwong, D.L.; Gusev, E.P.

Preface: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2: New Materials, Processes, and Equipment

conference paper

2006

Roozeboom, F.

Timans, P.J.

Öztürk, M.C.

Iwai, H.

Kwong, D.L.

Gusev, E.P.

TNO Identifier

1000256

Repository link

https://resolver.tno.nl/uuid:deaf38b6-1328-408f-a420-f50857e5c5a9

ISSN

19385862

Source title

Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment, 2, October 30-November 2 2006, Cancun, Mexico, 210th Meeting of the Electrochemical Society

Pages

iii

Files

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Preface: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2: New Materials, Processes, and Equipment

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