Electron beam generated hydrogen plasma for material testing and cleaning
other
Inside extreme ultraviolet (EUV) lithography machines a hydrogen plasma is generated due to ionization of the background gas with EUV photons. The interaction of scanner components with hydrogen plasma is tested in laboratory setups, where the properties of EUV generated plasma are mimicked. Here we present a novel experimental setup at TNO, where a low temperature hydrogen plasma is generated by means of electron impact ionization using a high current, high pressure electron beam (e-beam) gun.
TNO Identifier
997662
Publisher
TNO
Source title
PTB Seminar 2023, VUV and EUV Metrology, 13-15 November 2023, Berlin, Germany
Collation
1 p.
Place of publication
Delft, The Netherlands