Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD
article
An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150-350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (< 10-3 Ωcm), high transmittance in the visible wavelength region (> 80%) and a rough surface texture. The crystallite size and surface roughness increase with increasing deposition temperature and flow of argon ions. At the same time columnar textured growth gets less pronounced, a change to granular growth is observed. First p-i-n a-Si:H solar cells deposited on this material with initial efficiencies approaching 10% have been realised.
TNO Identifier
236162
ISSN
00406090
Source
Thin Solid Films, 392(2), pp. 226-230.
Publisher
Elsevier
Collation
5 p.
Place of publication
Amsterdam, The Netherlands
Pages
226-230
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