An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications

article





Groenen, R.

Linden, J.L.

Lierop, H.R.M. van

Schram, D.C.

Kuypers, A.D.

Sanden, M.C.M. van de
A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded arc. Films are deposited at 200 °C at the rate of 0.65-0.75 nm s-1 exhibiting low resistivity (<10-3 Ω cm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties.
Topics




Solar cellsZinc oxideExpanding thermal plasmaSurface textureTransparent conducting oxide
TNO Identifier
236008
Repository link
https://resolver.tno.nl/uuid:471f0e6b-4417-41b7-9157-1f05c9d92f26
ISSN
01694332
Source
Applied Surface Science, 173(1-2), pp. 40-43.
Publisher
Elsevier
Collation
4 p.
Place of publication
Amsterdam, The Netherlands
Pages
40-43
Files
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