Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

Veldhoven, J. van; Stodólna, A.S.; Storm, A.J.; Brink, J. van den; Geerits, N.; Vlaar, J.; Dekker, M.F.; Ushakov, A.

Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

article

2021

Veldhoven, J. van

Stodólna, A.S.

Storm, A.J.

Brink, J. van den

Geerits, N.

Vlaar, J.

Dekker, M.F.

Ushakov, A.

Topics

Electron beams Gas discharge devices Low-temperature plamas Nuclear and plasma sciences Plasma applications Plasma devices Plasma materials processing Plasma properties Plasmas

TNO Identifier

959536

Repository link

https://resolver.tno.nl/uuid:8aa42493-de5b-47ae-8758-c4df5b5ebbcf

Source

IEEE transactions on plasma science, 49(10), pp. 3132-3141.

Publisher

IEEE

Collation

10 p.

Pages

3132-3141

Files

To receive the publication files, please send an e-mail request to TNO Repository.

Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

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