Spatial Atomic Layer Deposition for large area and flexible electronics

other
2021
Bruele, F.J. van den

Grob, F.

Creyghton, Y.L.M.

Shen, J.

Bolt, P.

Poodt, P.W.G.
Topics
Atmospheric pressureAtomic layer depositionSpatial ALDAtmospheric process
TNO Identifier
958054
Repository link
https://resolver.tno.nl/uuid:0823549a-4087-45f4-beeb-0031dbc0cd23
Collation
32 p.
Files
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