Area-selective deposition of ruthenium by area-dependent surface diffusion

article






Grillo, F.

Soethoudt, J.

Marques, E.A.

Martin, L. de

Dongen, K. van

Ommen, J.R. van

Delabie, A.
Topics



















Atomic layer depositionMetal nanoparticlesMicroelectronicsMonte Carlo methodsRefractory metal compoundsSilicaSiliconSiO2 nanoparticlesSurface diffusionTitanium nitrideVapor depositionDeposition experimentsKinetic modelingKinetic monte carlo simulationMetal nitridesPatterned substratesPrecursor moleculesSurface terminationThreedimensional (3-d)Ruthenium compounds
TNO Identifier
955229
Repository link
https://resolver.tno.nl/uuid:e636d9d5-71e7-43db-9c21-9cb9f42ab12f
ISSN
08974756
Source
Chemistry of Materials, 32(22), pp. 9560-9572.
Publisher
American Chemical Society
Pages
9560-9572
Files
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