Method and apparatus for depositing atomic layers on a substrate
patent
Method of depositing an atomic layer on a substrate. the method comprises supplying a precursor gas fraom a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the presursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.
TNO Identifier
877957
Publisher
USPTO
Article nr.
US 10,676,822 B2
Collation
30 p.
Files
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