Sub-surface Imaging with Photo Thermal Actuation

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In the semiconductor industry, the need for characterization of subsurface features of wafers on a sub-nanometer level becomes ever more important. With Scanning Subsurface Probe Microscopy (SSPM), the smallest features can be measured with high resolution.
TNO Identifier
873571
Publisher
TNO
Collation
1 p.
Place of publication
Delft