First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology
conference paper
TNO is developing a novel Large Dynamic Range Atomic Force Microscope (LDR-AFM), primarily but not exclusively designed for sub-nm accurate overlay metrology. The LDR-AFM combines an AFM with a 6 degrees- of-freedom interferometric positioning stage, thereby enabling measurements of sub-nm features on a wafer over multiple millimeters marker-to-feature distances. The current work provides an overview of recent developments and presents the first results obtained after final integration of the complete system. This includes results on the AFM head development, the validated positioning stage performance, the first AFM images, and long-term stability measurements.
TNO Identifier
867797
ISSN
0277786X
ISBN
9781510625655
Publisher
SPIE
Article nr.
109592E
Source title
Proceedings Metrology, Inspection, and Process Control for Microlithography XXXIII, San Jose, CA, USA, 25-28 February 2019
Editor(s)
Ukraintsev, V.A.
Adan, O.
Adan, O.
Collation
11 p.
Files
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