Thermal nanolithography: a technology compatibility study

other
2019
Rajadurai, S.R.S.

Tamer, M.S.

Paul, P.

Maturová, K.

Wildschut, J.A.

Weber, S.

Bonanni, S.

Koppen, M.E.C.T. van

Lans, M.J. van der
TNO and SwissLitho AG were studying the feasibility of a high-throughput, maskless nanopatterning solution for nanostructures down to few nanometers using SwissLitho’s thermal scanning probe lithography (t-SPL)a. The solution enables: Parallelization of nanopatterning on wafers and samples; Non-destructive readout by implementing dynamic mode imaging; 10 nm patterning resolution; In-situ closed loop metrology of patterned features.
Topics
NanolithographyThermal nanolithographyNanopatterningERP Early Research ProgramERP 3D Nanomanufacturing Instruments
TNO Identifier
867635
Repository link
https://resolver.tno.nl/uuid:5f6bc64c-b9b2-430f-97b9-b81742b4754c
Publisher
TNO
Source title
SID Semicon Innovation Day, Science Centre Delft, 21 May 2019
Collation
1 p.
Place of publication
Delft
Files
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