Isotropic ALE of ZnO using Hacac and O2 plasma

other
2019
Mameli, A.

Verheijen, M.A.

Mackus, A.J.M.

Kessels, W.M.M.

Roozeboom, F.
Topics
Atomic layer etchingALEZnOAtomic layer depositionALDPlasma etchingZinc oxideIsotropic materialsIsotropic removalNanowiresInfrared spectroscopy
TNO Identifier
862231
Repository link
https://resolver.tno.nl/uuid:2a36c73e-6dcc-44bf-9fdf-93ef96675824
Collation
24 p.
Files
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