Isotropic Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

other
2018
Mameli, A.

Verheijen, M.A.

Mackus, A.J.M.

Kessels, W.M.M.

Roozeboom, F.
Topics
Atomic layer etchingALEAcetylacetone
TNO Identifier
814724
Repository link
https://resolver.tno.nl/uuid:79f4e696-dfdf-42dd-8b84-21ef1d6cb5c0
Collation
21 p.
Files
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