Latest developments on EUV reticle and pellicle research and technology at TNO

conference paper
2017
Verberk, R.

Koster, N.B.

Sligte, E. te

Staring, W.P.M.
Topics
EUV mask infra structureEUV reticlepellicleAcceptance testsInspectionMasksOptical tomographyStagesContamination controlInfra-structureOptics lifetimePellicleOptical instruments
TNO Identifier
781879
Repository link
https://resolver.tno.nl/uuid:e3d2857e-0f93-4ba5-a80f-4cad2a1bdd1a
ISSN
0277786X
ISBN
9781510613560
Publisher
SPIE
Article nr.
1044603
Source title
33rd European Mask and Lithography Conference, EMLC 2017, 26-28 June 2017, Dresden, Germany
Editor(s)
Finders, J.
Behringer, U.F.W.
Files
To receive the publication files, please send an e-mail request to TNO Repository.