14-1: Large-Area Processing of Solution Type Metal-Oxide in TFT Backplanes and Integration in Highly Stable OLED Displays
conference paper
Solution type metal-oxide semiconductor was processed on mass-production ready equipment and integrated in a backplane with ESL architecture TFTs. Excellent thickness uniformity of the semiconductor layer was obtained over the complete Gen1 glass substrate (320 mm x 352 mm), resulting in homogeneous TFT performance and bias stress reliability. An 85-ppi QVGA AMOLED display is demonstrated.
TNO Identifier
780624
Publisher
Wiley-Blackwell Publishing Ltd
Source title
SID Symposium Digest of Technical Papers
Pages
169-172
Files
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