Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi
conference paper
This paper describes the potential of hi-res display fabrication using OLED photolithography. We demonstrate 1250 ppi multicolor arrays, pixel scaling down to 3 μm pitch, integration in active displays, and improving lifetime after patterning (200 hours T75, smOLEDs). Photolithography can enable low-cost, high resolution displays for the 8K – VR era.
Topics
TNO Identifier
780623
ISSN
10710922
Publisher
Wiley-Blackwell Publishing Ltd
Source title
SID Symposium, Seminar, and Exhibition 2017, Display Week 2017. 21 May 2017 through 26 May 2017
Pages
623-626
Files
To receive the publication files, please send an e-mail request to TNO Repository.