First light on EBL2
conference paper
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS system. This paper describes the integration process and first light of the EUV source. EBL2 accepts a wide range of sample sizes, including EUV masks with or without pellicles. All types of samples will be loaded using a standard dual pod interface. EUV masks returned from EBL2 will retain their NXE compatibility to facilitate wafer printing on scanners after exposure in EBL2. The Beam Line provides high intensity EUV irradiation from a Sn-fueled EUV source from Ushio. EUV intensity, spectrum, and repetition rate are all adjustable. The XPS system is now operational and accepts samples up to reticle size.
TNO Identifier
756323
ISSN
0277-786X
Publisher
Society of Photo-optical Instrumentation Engineers SPIE
Source title
Extreme Ultraviolet (EUV) Lithography VIII Conference, San Jose, CA, USA, 27 February - 2 March 2017
Editor(s)
Panning, E.M.
Goldberg, K.A.
Goldberg, K.A.
Collation
7 p.