Area-Selective Atomic Layer Deposition of IN2O3:H Using a μ‑Plasma Printer for Local Area Activation

article








Mameli, A.

Kuang, Y.

Aghaee, M.

Ande, C.K.

Karasulu, B.

Creatore, M.

Mackus, A.J.M.

Kessels, W.M.M.

Roozeboom, F.
Topics

ALDAtomic layer deposition
TNO Identifier
745711
Repository link
https://resolver.tno.nl/uuid:1baec674-bdbf-4ea5-9b2b-cd59546d2654
DOI
https://dx.doi.org/10.1021/acs.chemmater.6b04469
Source
Chemistry of Materials, 29, pp. 921-925.
Publisher
ACS
Collation
5 p.
Pages
921-925
Files