Developments in plasma enhanced spatial ALD for high throughput applications [3.04]
conference paper
Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with exceptional dimensional and chemical stability providing flow geometries optimized for efficient radical transport are needed. This paper reports on the initial steps taken to provide and examine the required linear scalable plasma sources. The effectiveness of close-proximity direct and remote plasma sources are demonstrated using thin film deposition of Al2O3 and ZrO2.
Topics
TNO Identifier
537669
Source title
Proceedings International Conference on Coatings on Glass and Plastics, ICCG 2016, Braunschweig, Germany, June 12-16, 2016
Collation
5 p.
Pages
93-97
Files
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