Paper S12 5 : Self-aligned a-IGZO TFTs : Impact of S/D contacts formation on their Negative-Bias-Illumination-Stress (NBIS) instability
article
In this work, we present the impact of S/D contact formation, that is, by SiN plasma doping (hydrogen incorporation), metallic reduction (by calcium) and by argon plasma (compositional change) on NBIS instabilities of self-aligned a-IGZO TFTs.
TNO Identifier
533739
Source
SID Symposium Digest of Technical Papers, 46(June), pp. 55.
Publisher
Wiley
Pages
55
Files
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