True-color 640 ppi OLED arrays patterned by CA i-line photolithography
conference paper
In this paper, side-by-side patterning of red, green and blue OLEDs is demonstrated. To achieve 640 ppi arrays with 20 µm subpixel pitch, chemically amplified, i-line photoresist system with submicron resolution was used. These results show feasibility of obtaining full-color displays with ultra-high resolution.
TNO Identifier
533737
ISSN
0097966X
Source title
2015 SID International Symposium, 2 June 2015 through 3 June 2015
Editor(s)
Morreale J.
Pages
215-218
Files
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