A Spatial ALD oxide passivation module in an all-spatial etch-passivation cluster concept

article




Roozeboom, F.

Bruele, F. van den

Creyghton, Y.L.M.

Poodt, P.W.G.

Kessels, W.M.M.
Topics


Atmospheric pressureAtomic layer depositionOxide passivation
TNO Identifier
528483
Repository link
https://resolver.tno.nl/uuid:d1553462-af26-4dab-a60d-b51aedc89aaa
Source
ECS Transactions, 69(7), pp. 243-258.
Publisher
Electrochemical Society
Pages
243-258
Files
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