Progress on EUV Pellicle development
conference paper
Zoldesi, C.I.
Bal, K.
Blum, B.
Bock, G.
Brouns, D.
Dhalluin, F.
Dziomkina, N.
Arias Espinoza, J.D.
Hoogh, J. de
Houweling, S.
Jansen, M.
Kamali, M.
Kempa, A.
Kox, R.
Kruif, R. de
Lima, J.
Liu, Y.
Meijer, H.
Meiling, H.
Mil, I. van
Reijnen, M.
Scaccabarozzi, L.
Smith, D.
Verbrugge, B.
Winter, L. de
Xiong, X.
Zimmerman, J.
Bal, K.
Blum, B.
Bock, G.
Brouns, D.
Dhalluin, F.
Dziomkina, N.
Arias Espinoza, J.D.
Hoogh, J. de
Houweling, S.
Jansen, M.
Kamali, M.
Kempa, A.
Kox, R.
Kruif, R. de
Lima, J.
Liu, Y.
Meijer, H.
Meiling, H.
Mil, I. van
Reijnen, M.
Scaccabarozzi, L.
Smith, D.
Verbrugge, B.
Winter, L. de
Xiong, X.
Zimmerman, J.
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume manufacturing, EUV pellicle is being actively investigated. Last year ASML reported on our initial EUV pellicle feasibility. In this paper, we will update on our progress since then. We will also provide an update to pellicle requirements published last year. Further, we present experimental results showing the viability and challenges of potential EUV pellicle materials, including, material properties, imaging capability, scalability and manufacturability.
TNO Identifier
521417
Publisher
SPIE
Article nr.
90481N
Source title
Extreme Ultraviolet (EUV) Lithography V, San Jose, CA, USA, 23 February 2014
Editor(s)
Wood, O.R.
Panning, E.M.
Panning, E.M.
Pages
90481N-1 - 90481N-10
Files
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