A new concept for spatially-divided Reactive Ion Etching with ALD-based passivation

article









Roozeboom, F.

Kniknie, B.

Lankhorst, A.M.

Winands, G.

Knaapen, R.

Smets, M.

Poodt, P.

Dingemans, G.

Keuning, W.

Kessels, W.M.M.
Topics



Ion etching machineSpatially-divided Deep Reactive Ion EtchingAld-based passivationDRIE
TNO Identifier
513292
Repository link
https://resolver.tno.nl/uuid:eb004fb8-11cf-4b46-816f-ac3e241b0b34
Publisher
ECS
Pages
73-82
Files
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