TNO reticle handling test platform
conference paper
Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was built based on a modular concept with three uniform linked base frames. In the first stage of the project a dual pod loading unit, two exchange units for opening inner pods and a reticle flip unit are installed on the base frames. In the near future improvements on cleanliness will be tested and particle detection equipment will be integrated. The system will act as a testing platform for clean handling technology for industry. © 2014 SPIE.
Topics
TNO Identifier
507149
ISSN
1996756X
ISBN
9780819499714
Publisher
SPIE
Article nr.
904831
Source title
Extreme Ultraviolet (EUV) Lithography V, 24-27 February 2014, San Jose, CA, USA
Collation
6 p.