High-resolution direct-write patterning using focused ion beams
article
Over the last few years, significant improvements in sources, columns, detectors, control software, and accessories have enabled a wealth of new focused ion beam applications. In addition, modeling has provided many insights into ion-sample interactions and the resultant effects on the sample. With the knowledge gained, the community has found new ion-beam induced chemistries and ion-beam sources, allowing extending nanostructure fabrication and material deposition to smaller dimensions and better control for direct write and patterning. Insignificant proximity effects in resist-based ion beam lithography, combined with the availability of sub-nm ion spot sizes, opens the way to sub-10 nm structures and dense patterns. Additionally, direct-write ion beam nanomachining can process multilevel structures with arbitrary depths in one single process step, with all the information included in a single standard design file, thus enabling fabrication applications not achievable with any other technique. © 2014 Materials Research Society.
Topics
Ion-beam assisted depositionIon-beam processingIon-implantationIon-solid interactionsLithography (removal)MicrostructuresApplication programsFocused ion beamsGalliumHeliumIon beam assisted depositionIonsMicrostructuresNeonSiliconDirect-write patterningIon-beam applicationsMaterial depositionMulti-level structuresNanostructure fabricationProximity effectsNanostructuresFIB
TNO Identifier
500738
ISSN
08837694
Source
MRS Bulletin, 39(4), pp. 342-346.
Publisher
Materials Research Society
Pages
342-346
Files
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