Evaluation of EUV resist performance below 20nm CD using helium ion lithography

other

2014

Maas, D.J.

Veldhoven, E. van

Pohlmann, R.C.M.

Langen-Suurling, A. van

Alkemade, P.F.A.

Wulster, S.

Hoefnagels, R.

Verspaget, C.

Meessen, J.

Fliervoet, T.

Topics

Energy transfer EUV lithography EUV resist characterization Helium Ion Microscope Lithography Proximity effect Scanning Helium Ion Beam Lithography Electron beam lithography Extreme ultraviolet lithography Proximity correction

TNO Identifier

490520

Repository link

https://resolver.tno.nl/uuid:fb176d31-782b-423e-83f9-e5a020ceb501

Publisher

TNO

Collation

1 p.

Place of publication

Delft

Files

Download maas-2014-evaluation.pdf