Atomic Layer Deposition Applications 9 : Preface
conference paper
TNO Identifier
483371
Publisher
ECS
Source title
International symposium on Atomic Layer Deposition Applications 9, held during the 224th Meeting of the Electrochemical Society. From Oct. 27 to Nov. 1, 2013, in the city of San Francisco (CA, USA).
Pages
I - IX
Files
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