Surface metrology of 150 mm substrate with nanometer accuracy with the Philips beamwriter
article
We show that the Philips Beamwriter can be used very well as a metrology system. Coordinates of features in a 100mm × 100mm field can be measured with a repeatability of 15 nm (1 σ). A rotational drift of the substrate with respect to the stage of 40 nrad can be recognized clearly. Measured obtainable machine-to-machine overlay is 150 nm. Deviations from an ideal Cartesian system amount up to 100 nm. From the results we can conclude that this can be brought down to 30 nm by applying higher order software corrections. © 1989
TNO Identifier
246237
Source
Microelectronic Engineering, 9(1-4), pp. 419-423.
Pages
419-423
Files
To receive the publication files, please send an e-mail request to TNO Repository.