Atmospheric pressure CVD of SNO2 and ZNO:AL
conference paper
Atmospheric pressure CVD (APCVD) is a highly cost effective method of depositing transparent conductive oxides (TCOs). In this work, insights in alcohol addition in the widely applied SnO2 process are discussed, including high resolution TEM images. Furthermore, the APCVD process of ZnO:Al was demonstrated on an industrial moving belt APCVD system. A high deposition rate of 14 nm/s, a resistivity down to 0.5 mOhm cm and a transparency about 85% in the visible range were obtained. Furthermore, modeling of the CVD process clearly enhanced understanding of the process and is a good tool for process optimization in combination with experimental verification. A-Si solar cells approaching 8% were obtained, using the ZnO on glass as a superstrate.
TNO Identifier
533090
Source title
27th European Photovoltaic Solar Energy Conference and Exhibition, Frankfurt
Collation
4 p.
Pages
2286-2289
Files
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