Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes
conference paper
A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.
Topics
TNO Identifier
520142
ISBN
9780956679000
Publisher
Euspen
Source title
Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
Editor(s)
Shore P.
Spaan H.
Burke T.
Spaan H.
Burke T.
Pages
36-39
Files
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