Growth of ZnOx:Al by high-throughput CVD at atmospheric pressure

Illiberi, A.; Simons, P.J.P.M.; Kniknie, B.; Deelen, J. van; Theelen, M.J.; Zeman, M.; Tijssen, M.; Zijlmans, W.; Steijvers, H.L.A.H.; Habets, D.; Janssen, A.C.; Beckers, E.H.A.

Growth of ZnOx:Al by high-throughput CVD at atmospheric pressure

article

2012

Illiberi, A.

Simons, P.J.P.M.

Kniknie, B.

Deelen, J. van

Theelen, M.J.

Zeman, M.

Tijssen, M.

Zijlmans, W.

Steijvers, H.L.A.H.

Habets, D.

Janssen, A.C.

Beckers, E.H.A.

Topics

Metalorganic chemicalvapor deposition Thin films Transparent conductive oxide Zinc Oxide Solar cells

TNO Identifier

463698

Repository link

https://resolver.tno.nl/uuid:8dd76a10-d38f-4c39-a9e0-2a5e00be3a0b

Source

Journal of crystal growth, 347, pp. 56-61.

Pages

56-61

Files

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Growth of ZnOx:Al by high-throughput CVD at atmospheric pressure

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