Is helium ion beam induced processing applicable to EUV mask repair?

conference paper



Maas, D.J.

Bekman, H.H.P.T.

Veldhoven, E. van

Alkemade, P.F.A.
Topics


helium ion microscopyion beam induced processingEUV mask repair
TNO Identifier
463674
Repository link
https://resolver.tno.nl/uuid:067fc9a7-8ca5-40f1-bd4b-45789e35fea2
Source title
15th European Microscopy Congress, 16-21 September 2012, Manchester, UK
Files
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