Patterned deposition by plasma enhanced spatial atomic layer deposition

article




Poodt, P.W.G.

Kniknie, B.

Branca, A,

Winands, G.J.J.

Roozeboom, F.
Topics




Thin filmsZinx oxideAtomic layer depositionDeposition rateIndustrial process
TNO Identifier
445960
Repository link
https://resolver.tno.nl/uuid:de6f07c9-844d-402b-b0f7-ac194f20c8b6
Source
Physica Status Solidi (Rapid Research Letters), 5(4), pp. 165-167.
Pages
165-167
Files
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