Industrial high-rate (~14 nm/s) deposition of low resistive and transparent ZnOx:Al films on glass
article
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. Tertiary-butanol has been used as oxidant for diethylzinc and trimethylaluminium as dopant gas. ZnOx:Al films can be grown at very high deposition rates of ~14 nm/s for a substrate speed from 150 to 500 mm/min. The electrical, structural (crystallinity and morphology) and optical properties of the deposited films have been characterized by using Hall, four point probe, X-ray diffraction, atomic force microscope and spectrophotometer, respectively. All the films have c-axis, (002) preferential orientation and good crystalline quality. ZnO x:Al films are highly conductive (R<9 O/sq, for a film thickness above 1300 nm) and transparent in the visible range (>80%). These results show that ZnOx:Al films with good electrical and optical properties can be grown with a high throughput industrial CVD process at atmospheric pressure. First pin a-Si:H solar cells have been deposited on this material, with initial efficiency approaching 8%.
Topics
Aluminum doped zinc oxideAtmospheric pressure chemical-vapor-depositionDeposition rateThin film solar cellsTransparent conductive oxidea-Si:HAl filmsAluminum-doped zinc oxideAluminum-doped ZnOAtomic force microscopesCrystalline qualityCrystallinitiesCVD processDeposited filmsDiethylzincElectrical and optical propertiesFour point probeHigh deposition ratesHigh rateHigh throughputIn-lineInitial efficiencyMetalorganic chemical vapor depositionPreferential orientationThin film solar cellsTransparent conductive oxidesTrimethylaluminiumVisible rangeZnOAluminumAtmospheric chemistryAtmospheric pressureAtmosphericsAtomic force microscopyConductive filmsCrystal atomic structureDepositionDeposition ratesDoping (additives)Electric propertiesGlassIndustryMetallic filmsMetallorganic chemical vapor depositionNanostructured materialsOptical propertiesSolar cellsThin filmsVapor depositionVaporsX ray diffractionZincZinc oxideAluminum coatings
TNO Identifier
429694
ISSN
09270248
Source
Solar Energy Materials and Solar Cells, 95(7), pp. 1955-1959.
Pages
1955-1959
Files
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