Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment : Preface

Gusev, E.P.; Iwai, H.; Kwong, D.L.; Roozeboom, F.; Öztürk, M.C.; Timans, P.J.; Narayanan, V.

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment : Preface

conference paper

2010

Gusev, E.P.

Iwai, H.

Kwong, D.L.

Roozeboom, F.

Öztürk, M.C.

Timans, P.J.

Narayanan, V.

TNO Identifier

426212

Repository link

https://resolver.tno.nl/uuid:0be11999-1e5f-4510-a949-82fec21bb831

ISSN

19385862

ISBN

9781566777919

Source title

Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment, 6 - 217th ECS Meeting, 26 April 2010 through 27 April 2010, Vancouver, BC, Conference code: 82948

Pages

iii

Files

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Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment : Preface

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