The helium ion microscope: Advances in technology and applications
article
Helium ion microscopy (HIM) offers the highest spatial resolution surface imaging of any scanning beam method with extremely high surface sensitivity providing unmatched sample information at the nanoscale. SEM imaging prevented high-resolution characterization included serious charging frustrated the imaging when no conductive coating was used. The charge control possible in HIM allows high-resolution imaging with excellent surface detail. The technology can be used to modify or even fabricate materials on the nanometer scale using two general approaches including lithography based on chemical alteration of a soluble cover layer on a substrate material. In the beam-induced deposition the substrate is exposed to a precursor gas adsorbs onto the substrate, but does not react. The exposure to energetic particles such as electrons or helium ions, causes decomposition of the adsorbed precursor molecules. With a well-focused beam that is moved in a prescribed pattern the complex structures can be fabricated with small feature sizes.
TNO Identifier
275982
ISSN
0044-7749
Source
American Laboratory, 41(12), pp. 26-28.
Pages
26-28
Files
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