Sub-10-nm nanolithography with a scanning helium beam

Sidorkin, V.; Veldhoven, E. van; Drift, E. van der; Alkemade, P.; Salemink, H.; Maas, D.J.

Sub-10-nm nanolithography with a scanning helium beam

article

2009

Sidorkin, V.

Veldhoven, E. van

Drift, E. van der

Alkemade, P.

Salemink, H.

Maas, D.J.

Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist. © 2009 American Vacuum Society.

Topics

Helium ion beams High resolution High sensitivity Hydrogen silsesquioxane Pattern-definition techniques Proximity effects

TNO Identifier

241695

Repository link

https://resolver.tno.nl/uuid:b8076eb3-3aff-46e4-8b04-e4f8ab172d0a

ISSN

10711023

Source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 27(4), pp. L18-L20.

Pages

L18-L20

Files

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Sub-10-nm nanolithography with a scanning helium beam

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