Study of wet chemical etching AlxGa1-xInP2 films using hydrochloric acid

article






Deelen, J. van

Mulder, P.

Bauhuis, G.J.

Niftrik, A.T.J. van

Haverkamp, E.J.

Schermer, J.J.

Larsen, P.K.
TNO Identifier
477756
Repository link
https://resolver.tno.nl/uuid:c8336c74-45f2-488d-9d30-d87527db1683
Source
Journal of the Electrochemical Society, 153(April), pp. C442-C448.
Publisher
Electrochemical Society
Collation
8 p.
Pages
C442-C448
Files
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