Tin oxide precursor chemistry and its link to coating properties
article
The chemical vapor deposition technique to optimize the manufacture of SnO2 coated glasses was presented. SnO2 growth rates for several precursors were examined and their relative magnitudes were compared with the properties of the deposit, taking into account the chemical nature of the precursor. A set of growth rates and the morphological data obtained, using a stagnation point flow reactor were also analyzed. It was found that TTC/O 2 precursor system yields either extremely poor quality films or no films, and deposition from TTC/O2 cannot be described as a thin film.
Topics
TNO Identifier
238285
ISSN
00027812
Source
American Ceramic Society Bulletin, 84(1), pp. 37-41.
Publisher
American Ceramic Society
Pages
37-41
Files
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