Vapor pressures of precursors for the CVD of titanium nitride and tin oxide

article





Mol, A.M.B. van

Driessen, J.P.A.M.

Linden, J.L.

Croon, M.H.J.M. de

Spee, C.I.M.A.

Schouten, J.C.
TNO Identifier
236050
Repository link
https://resolver.tno.nl/uuid:93c152d5-f2cc-4438-b544-477c6e5622a0
ISSN
09481907
Source
Chemical Vapor Deposition, 7(3), pp. 101-104.
Publisher
Wiley
Collation
4 p.
Place of publication
Weinheim
Pages
101-104
Files
To receive the publication files, please send an e-mail request to TNO Repository.