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Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)The present disclosure concerns an atomie layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...patent 2023
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Mameli, A. (author), Kronemeijer, A.J. (author), Roozeboom, F. (author)The present disclosure relates to a method of manufacturing a thin film device. A multilevel nanoimprint lithography template is transferred into a thin film stack comprising an electrode layer and a blanket sacrificial layer covering the electrode layer. The template is transferred, thereby patterning the device and exposing a predefined...patent 2023
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Sastre Calabuig, F. (author), Buskens, P.J.P. (author), Meulendijks, N.M.M. (author)The invention pertains in a first aspect to a plasmonic catalytic process for the reverse water-gas shift (rWGS) reaction using a plasmonic catalyst comprising supported plasmonic metal nanoparticles, and to such a catalyst. An aspect of the invention pertains to a plasmonic catalytic process for the reverse water gas shift reaction (1) CO2 + Hz...patent 2022
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Creyghton, Y.L.M. (author), Poodt, P.W.G. (author), Simor, M. (author), Roozeboom, F. (author)A plasma source has an outer surface, interrupted by an aperture for delivering an atmospheric plasma from the outer surface. A transport mechanism transports a substrate in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface the and the substrate...patent 2022
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Knaapen, R.J.W. (author), Olieslagers, R. (author), van den Berg, D. (author), van den Boer, M.C. (author), Roozeboom, F. (author)Method of performing atomic layer deposition. The method comprises supplying a precursor gas towards a substrate, using a deposition head including one or more gas supplies, including a precursor gas supply. The precursor gas reacts near a surface of the substrate for forming an atomic layer. The deposition head has an output face comprising the...patent 2021
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Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)The present disclosure concerns an atomic layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...patent 2021
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Mameli, A. (author), Kronemeijer, A.J. (author), Roozeboom, F. (author)The present disclosure relates to a method of manufacturing a thin film device (100). A multilevel nanoimprint lithography template (20) is transferred into a thin film stack comprising an electrode layer (11) and a blanket sacrificial layer (12) covering the electrode layer. The template is transferred, thereby patterning the device (100) and...patent 2021
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Roozeboom, F. (author), Ehm, D.H. (author), Illiberi, A. (author), Becker, M. (author), te Sligte, E. (author), Creijghton, Y.L.M. (author)A method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation includes: performing an atomic layer etching process for at least partially removing the contamination layer (24) from the optical surface (14a), which, in tum, includes: exposing the...patent 2021
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Vermeer, A.J.P.M. (author), Roozeboom, F. (author), van Deelen, J. (author)Method of depositing an atomic layer on a substrate. the method comprises supplying a precursor gas fraom a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the presursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the...patent 2020
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van der Heijden, A.E.D.M. (author), van Geest, E.P. (author), van den Elshout, J.J.M.H. (author)The invention pertains to the synthesis of carbamate and urea compounds. In particular the invention is directed to the synthesis of carbamate and urea compounds which may be used in the production of compounds that are used to stabilize nitrocellulose. The method of the invention comprises preparing a carbamate or urea derivative comprising...patent 2020
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Straathof, M.H. (author), van Driel, C.A. (author)Propellant charges or grains having printed layers of two or more energetic materials are described along with methods for preparing and using them.patent 2020
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van Driel, C.A. (author), Zebregs, M. (author), Ramlal, D.R. (author), Straathof, M.H. (author)The invention is directed to a co-layered propellant grain having an exposed outer surface, wherein said propellant grain comprises an outer layer comprising a slow burning propellant composition located on essentially the entire outer surface of the grain, and an inner layer comprising a fast burning propellant composition having a higher...patent 2019
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Roozeboom, F. (author), Lankhorst, A.M. (author), Poodt, P.W.G. (author), Koster, N.B. (author), Winands, G.J.J. (author), Vermeer, A.J.P.M. (author)The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the...patent 2017
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Vermeer, A.J.P.M. (author), Roozeboom, F. (author), van Deelen, J. (author)Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the...patent 2017
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van Driel, C.A. (author), Ramlal, D.R. (author), Zebregs, M. (author), Straathof, M.H. (author)The invention is in the field of propellants. In particular the invention is directed to a propellant for ammunition, such as medium and large caliber gun ammunition, having improved performance. In accordance with the present invention a propellant charge comprises one or more longitudinally extending, progressive-externally burning grains...patent 2017
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van den Brand, J. (author), Dietzel, A.H. (author), Broers, S.C. (author), Saalmink, M. (author)The invention relates to an apparatus for laminating a first and a second sheet with a plane carrier (10) and a drum shaped carrier (20) for carrying a respective sheet. The apparatus has a first main operational mode wherein the drum shaped carrier (20) is at distance from a first carrier surface (12) of the plane carrier (10) in said third...patent 2016
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Vermeer, A.J.P.M. (author), Roozeboom, F. (author), van Deelen, J. (author)Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the...patent 2016
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- Creyghton, Y.L.M. (author), Poodt, P.W.G. (author), Simor, M. (author), Foozeboom, F. (author) patent 2015
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- Jedema, F.J. (author), Besling, W.F.A. (author), Roozeboom, F. (author), van den Boomen, R.W.J.M. (author), van Straten, F.E. (author) patent 2015
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Klootwijk, J.H. (author), Roozeboom, F. (author), Ruigrok, J.J.M. (author), Reefman, D. (author)An integration substrate for a system in package comprises a through-substrate via and a trench capacitor wherein with a trench filling that includes at least four electrically conductive capacitor-electrode layers in an alternating arrangement with dielectric layers. --The capacitor-electrode layers are alternatingly connected to a respective...patent 2014
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