Searched for: subject%3A%22deposition%22
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Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)
The present disclosure concerns an atomie layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...
patent 2023
document
Kozhevnikov, A. (author), Kunnen, R.P.J. (author), van Baars, G.E. (author), Clercx, H.J.H. (author)
Purpose – This study aims to examine the feasibility of feedforward actuation of the recoater blade position to alleviate the resin surface nonuniformity while moving over deep-to-shallow transitions of submerged (already cured) geometric features. Design/methodology/approach – A two-dimensional computational fluid dynamics (CFD) model has been...
article 2022
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Jain, H. (author), Creatore, M. (author), Poodt, P. (author)
Trimethylaluminum is the most used aluminum precursor in atomic and molecular layer deposition (ALD/MLD). It provides high growth-per-cycle (GPC), is highly reactive and is relatively low cost. However, in the deposition of hybrid alucone films, TMA tends to infiltrate into the films requiring very long purge steps and thereby limiting the...
article 2022
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Mameli, A. (author), Parish, J.D. (author), Dogan, T. (author), Gelinck, G. (author), Snook, M.W. (author), Straiton, A.J. (author), Johnson, A.L. (author), Kronemeijer, A.J. (author)
Spatial atomic layer deposition (sALD) of p-type SnO is demonstrated using a novel liquid ALD precursor, tin(II)-bis(tert-amyloxide), Sn(TAA)2, and H2O as the coreactant in a process which shows an increased deposition rate when compared to conventional temporal ALD. Compared to previously reported temporal ALD chemistries for the deposition of...
article 2022
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Jin, J. (author), Pang, M. (author), Segers, A. (author), Han, W. (author), Fang, L. (author), Li, B. (author), Feng, H. (author), Lin, H.X. (author), Liao, H. (author)
Last spring, super dust storms reappeared in East Asia after being absent for one and a half decades. The event caused enormous losses in both Mongolia and China. Accurate simulation of such super sandstorms is valuable for the quantification of health damage, aviation risks, and profound impacts on the Earth system, but also to reveal the...
article 2022
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Merkx, M.J.M. (author), Jongen, R.G.J. (author), Mameli, A. (author), Lemaire, P.C. (author), Sharma, K. (author), Hausmann, D.M. (author), Kessels, W.M.M. (author), Mackus, A.J.M. (author)
As the semiconductor industry progresses toward more complex multilayered devices with ever smaller features, accurately aligning these layers with respect to each other has become a bottleneck in the advancement to smaller transistor nodes. To avoid alignment issues, area-selective atomic layer deposition (ALD) can be employed to deposit...
article 2021
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Mameli, A. (author), Roozeboom, F. (author)
public lecture 2021
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van den Bruele, F.J. (author), Grob, F. (author), Creyghton, Y.L.M. (author), Shen, J. (author), Bolt, P. (author), Poodt, P.W.G. (author)
public lecture 2021
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Roozeboom, F. (author)
The IRDS 2017 Roadmap catches the scaling challenges faced by the semiconductor industry in the upcoming decades by the overall term "3D Power Scaling". In the past scaling era superior material properties and critical dimensions nearing single-digit nanometer values could still be realized by cost-effective technology solutions. As we approach...
public lecture 2021
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de Braaf, B. (author), Rops, C.M. (author), Storm, C. (author)
In atomic layer deposition (ALD), thin layers of materials are deposited on a substrate with atomic layer precision in the vertical direction. The ability to control layer growth in the lateral direction as well is expected to greatly increase the potential of ALD as a path to the bottom-up additive fabrication of electronic devices like solar...
article 2021
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Mameli, A. (author), Karasulu, B. (author), Roozeboom, F. (author)
public lecture 2021
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Feroz Islam, M. (author), Middelkoop, H. (author), Schot, P.P. (author), Dekker, S.C. (author), Griffioen, J. (author)
The Ganges-Brahmaputra-Meghna (GBM) delta plain within Bangladesh is one of the most vulnerable to relative sea level rise (RSLR) in the world especially under current anthropogenically modified (i.e., embanked) conditions. Tidal river management (TRM) as practiced in coastal regions of Bangladesh may provide an opportunity to combat RSLR by...
article 2021
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Smirnov, Y. (author), Schmengler, L. (author), Kuik, R. (author), Repecaud, P.A. (author), Najafi, M. (author), Zhang, D. (author), Theelen, M. (author), Aydin, E. (author), Veenstra, S. (author), de Wolf, S. (author), Morales-Masis, M. (author)
Sputtered transparent conducting oxides (TCOs) are widely accepted transparent electrodes for several types of high-efficiency solar cells. However, the different sputtering yield of atoms makes stoichiometric transfer of target material challenging for multi-compounds. Additionally, the high kinetic energies of the arriving species may damage...
article 2021
document
Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)
The present disclosure concerns an atomic layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...
patent 2021
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Melskens, J. (author), Theeuwes, R.J. (author), Black, L.E. (author), Berghuis, W.J.H. (author), Macco, B. (author), Bronsveld, P.C.P. (author), Kessels, W.M.M. (author)
article 2021
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Mione, M.A. (author), Vandalon, V. (author), Mameli, A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2 plasma is reported along with an investigation of its underlying growth mechanism. Within the temperature range of 100−250 °C, the process demonstrates self-limiting growth with a growth per...
article 2021
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Palstra, S.W.L. (author), Wallinga, J. (author), Viveen, W. (author), Schoorl, J.M. (author), van den Berg, M. (author), van der Plicht, J. (author)
Two cores from a Weichselian periglacial alluvial fan were dated using 14C and OSL, to verify the reliability of both methods and check the upper dating limit of the 14C method. Both dating methods yielded a similar chronology for core Eerbeek-I, with infinite 14C dates for the lower part where OSL dates indicated ages of over 45 ka. Finite 14C...
article 2021
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Kozhevnikov, A. (author), Kunnen, R.P.J. (author), van Baars, G.E. (author), Clercx, H.J.H. (author)
The leading edge bulge is a known defect in stereolithography with free-surface recoating. It is a resin excess that remains after deposition over a deep-to-shallow topographic transition, the leading edge of the cavity. In this paper, we explore an approach based on changing the gap between the recoating blade and the previously cured layer to...
article 2021
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van der Graaf, S.C. (author), Janssen, T.A.J. (author), Erisman, J.W. (author), Schaap, M. (author)
Atmospheric reactive nitrogen (N) deposition is an important driver of carbon (C)sequestration in forest ecosystems. Previous studies have focused on N-C interactions in various ecosystems; however, relatively little is known about the impact of N deposition on ecosystem C cycling during climate extremes such as droughts. With the occurrence and...
article 2021
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Mameli, A. (author), Brüner, P. (author), Roozeboom, F. (author), Grehl, T. (author), Poodt, P. (author)
public lecture 2020
Searched for: subject%3A%22deposition%22
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