Atmospheric pressure plasma enhanced spatial ALD of ZrO2 for low-temperature, large-area applications

High permittivity (high-k) materials have received considerable attention as alternatives to SiO2 for CMOS and low-power flexible electronics applications. In this study, we have grown high-quality ZrO2 by using atmospheric-pressure plasma-enhanced spatial ALD (PE-sALD), which, compared to temporal ALD, offers higher effective deposition rates...

Plasma-Enhanced Atmospheric-Pressure Spatial ALD of Al2O3 and ZrO2

Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH,...

Developments in plasma enhanced spatial ALD for high throughput applications [3.04]

Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with...

Treatment of Polymer Surfaces with Surface Dielectric Barrier Discharge Plasmas

Due to ongoing improvements in polymer-based materials, they are being used in an increasingly wider range of applications. In addition to special bulk physical properties, specific surface properties are often required in particular applications. However, common polymers very often do not possess the desired surface properties. Several...

Deposition of zinc oxide using an atmospheric low temperature plasma process