- document
- Aganovic, A. (author), Cao, G. (author), Fecer, T. (author), Ljugqvist, B. (author), Lytsy, T. (author), Radtke, A. (author), Reinmuller, B. (author), Traversari, A.A.L. (author) article 2021
- document
- Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author) other 2014
- document
-
Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author)Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was...conference paper 2014