Searched for: subject:"Transparent%5C+conductive%5C+oxide"
(1 - 17 of 17)
document
Theelen, M.J. (author), Hagedoorn, C. (author), Götz-Köhler, M. (author), Weeber, A. (author), Neugebohn, N. (author)
Oxide/metal/oxide (OMO) layer stacks are promising replacements for conventional transparent conductive oxides in thin-film photovoltaics. They can provide colouration of the solar cells by adjusting their thickness to optimised optical resonances. Green OMO multistacks were deposited on glass by subsequent sputtering of aluminium doped zinc...
article 2021
document
Smirnov, Y. (author), Schmengler, L. (author), Kuik, R. (author), Repecaud, P.A. (author), Najafi, M. (author), Zhang, D. (author), Theelen, M. (author), Aydin, E. (author), Veenstra, S. (author), de Wolf, S. (author), Morales-Masis, M. (author)
Sputtered transparent conducting oxides (TCOs) are widely accepted transparent electrodes for several types of high-efficiency solar cells. However, the different sputtering yield of atoms makes stoichiometric transfer of target material challenging for multi-compounds. Additionally, the high kinetic energies of the arriving species may damage...
article 2021
document
van Deelen, J. (author), Frijters, C. (author), Suijlen, M. (author), Barink, M. (author)
The effect of the front contact characteristics on the working of monolithically integrated thin film solar panels and effective ways of improving the front contact are discussed. Efficiencies were calculated for various cell lengths and scribing areas in between cells (interconnection dead zone widths). The application of a metallic grid was...
article 2015
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van Deelen, J. (author), Barink, M. (author), Klerk, L. (author), Voorthuijzen, P. (author), Hovestad, A. (author)
Modeling indicates a potential efficiency boost of 17% if thin-film solar panels are featured with a metallic grid. Variations of transparent conductive oxide sheet resistance, cell length, and grid dimensions are discussed. These parameters were optimized simultaneously to obtain the best result. Moreover, the power output as a function of...
article 2015
document
Illiberi, A. (author), Poodt, P. (author), Roozeboom, F. (author)
The industrial need for high-throughput and low-cost ZnO deposition processes has triggered the development of atmospheric vapor-phase deposition techniques which can be easily applied to continuous, in-line manufacturing. While atmospheric CVD is a mature technology, new processes for the growth of transparent conductive oxides on thermally...
article 2014
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Illiberi, A. (author), Grob, F. (author), Frijters, C. (author), Poodt, P. (author), Ramachandra, R. (author), Winands, H. (author), Simor, M. (author), Bolt, P.J. (author)
Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma-enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ∼7 nm/s are achieved at low temperature (200°C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in the visible range (90%). By a short (∼minute)...
article 2013
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Wu, Y. (author), Potts, S.E. (author), Hermkens, P.M. (author), Knoops, H.C.M. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)
Atomic layer deposition offers the unique opportunity to control, at the atomic level, the 3D distribution of dopants in highly uniform and conformal thin films. Here, it is demonstrated that the maximum doping efficiency of Al in ZnO can be improved from ∼10% to almost 60% using dimethylaluminum isopropoxide (DMAI, Al(CH3)2(OiPr)) as an...
article 2013
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Illiberi, A. (author), Scherpenborg, R. (author), Poodt, P. (author), Roozeboom, F. (author)
Undoped and indium doped ZnO films have been grown by Spatial Atomic Layer Deposition at atmospheric pressure. The electrical properties of ZnO films are controlled by varying the indium content in the range from 0 to 15 %. A minimum resistivity value of 3 mΩ•cm is measured in 180 nm thick films for In/(In+Zn) ratio equal to 6 %, corresponding...
article 2013
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Illiberi, A. (author), Scherpenborg, R. (author), Wu, Y. (author), Roozeboom, F. (author), Poodt, P. (author)
The possibility of growing multicomponent oxides by spatial atmospheric atomic layer deposition has been investigated. To this end, Al xZn1-xO films have been deposited using diethyl zinc (DEZ), trimethyl aluminum (TMA), and water as Zn, Al, and O precursors, respectively. When the metal precursors (i.e., TMA and DEZ) are coinjected in the...
article 2013
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van Deelen, J. (author), Illiberi, A. (author), Hovestad, A. (author), Barbu, I. (author), Klerk, L. (author), Buskens, P. (author), TNO, Department of Thin Film Technologies, De Rondom 1, 5612 AP Eindhoven, Netherlands (author)
An overview of different transparent conductors is given. In addition, atmospheric pressure CVD of ZnO resulted in conductivities below 1 mΩ cm for a temperature of 480°C, whereas at a process temperature of 200°C a value of 2 mΩ cm was obtained. Also atmospheric pressure spatial ALD was used to make conductive ZnO. Furthermore, the properties...
conference paper 2012
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van Deelen, J. (author), Kniknie, B.J. (author), Grob, F.T.J. (author), Volintiru, I. (author), Roozeboom, F. (author), Poodt, P.W.G. (author), Illiberi, A. (author)
Transparent conductive oxide (TCO) coated glass is widely used in thin film PV. Atmospheric pressure chemical vapor deposition (APCVD) is a highly cost effective method of deposition and apart from metal precursor and oxygen precursor, other additives can improve the layer quality. In this contribution, we present an overview of the latest...
conference paper 2012
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van Deelen, J. (author), Kniknie, B.J. (author), Steijvers, H.L.A.H. (author), Mannie, G. (author), Thune, P. (author), Illiberi, A. (author)
Atmospheric pressure CVD (APCVD) is a highly cost effective method of depositing transparent conductive oxides (TCOs). In this work, insights in alcohol addition in the widely applied SnO2 process are discussed, including high resolution TEM images. Furthermore, the APCVD process of ZnO:Al was demonstrated on an industrial moving belt APCVD...
conference paper 2012
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Illiberi, A. (author), Simons, P.J.P.M. (author), Kniknie, B. (author), van Deelen, J. (author), Theelen, M.J. (author), Zeman, M. (author), Tijssen, M. (author), Zijlmans, W. (author), Steijvers, H.L.A.H. (author), Habets, D. (author), Janssen, A.C. (author), Beckers, E.H.A. (author)
article 2012
document
van Deelen, J. (author), Rendering, H. (author), 't Mannetje, H.H. (author), Klerk, L. (author), Hovestad, A. (author)
At present, transparent conducting oxides (TCOs) are still superior in performance to most other transparent conductors. Results on opto-electronic modeling and design optimization of TCOs are presented using a monolithically integrated CIGS cell configuration as case. For various cell dimensions and TCO characteristics, the cell output was...
conference paper 2012
document
Illiberi, A. (author), Kniknie, B. (author), van Deelen, J. (author), Steijvers, H.L.A.H. (author), Habets, D. (author), Simons, P.J.P.M. (author), Janssen, A.C. (author), Beckers, E.H.A. (author)
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. Tertiary-butanol has been used as oxidant for diethylzinc and trimethylaluminium as dopant gas. ZnOx:Al films can be grown at very high deposition rates of ~14 nm/s...
article 2011
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Hovestad, A. (author), Tacken, R.A. (author), Rendering, H. (author), TNO Industrie en Techniek (author)
article 2009
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van Deelen, J. (author), van Mol, A.M.B. (author), Poodt, P.W.G. (author), Grob, F. (author), Spee, C.I.M.A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is...
conference paper 2009
Searched for: subject:"Transparent%5C+conductive%5C+oxide"
(1 - 17 of 17)